Performance and Stability Assessment of Graphene-Based Quantum Hall Devices for Resistance Metrology

authored by
Atasi Chatterjee, Mattias Kruskopf, Martin Götz, Yefei Yin, Eckart Pesel, Pierre Gournay, Benjamin Rolland, Jan Kučera, Stephan Bauer, Klaus Pierz, Bernhard Schumacher, Hansjörg Scherer
Abstract

For more than three decades, GaAs/AlGaAs quantum Hall (QH) devices are being used as standards for the realization of the dc resistance unit ohm. Recently, the outstanding performance of graphene-based QH resistance (QHR) devices signifies an immense potential for a transition from GaAs to graphene-based devices in the field of resistance and also impedance metrology, with equally good accuracy. The recent developments in epitaxial graphene (EG) quality and fabrication of EG-based doped QHR devices and their improved performance tested in several national metrology institutes (NMIs) all over the world have demonstrated a more user-friendly dissemination of the unit ohm since they can be operated at relatively low magnetic fields and higher temperatures in comparison to existing GaAs-based devices. In this work, we have extensively tested the temporal stability of the magneto-transport properties of our graphene QH devices fabricated in the Physikalisch-Technische Bundesanstalt (PTB) and the resistance quantization performance by means of repeated high-accuracy cryogenic current comparator (CCC) measurements with several devices. Together with interlaboratory comparisons between NMIs, the performance and stability assessment demonstrate the readiness of the technology for calibration purposes in resistance metrology.

Organisation(s)
QuantumFrontiers
External Organisation(s)
National Metrology Institute of Germany (PTB)
International Bureau of Weights and Measures (BIPM)
Czech Metrology Institute (CMI)
Type
Article
Journal
IEEE Transactions on Instrumentation and Measurement
Volume
72
Pages
1-6
ISSN
0018-9456
Publication date
2023
Publication status
Published
Peer reviewed
Yes
ASJC Scopus subject areas
Instrumentation, Electrical and Electronic Engineering
Electronic version(s)
https://doi.org/10.1109/tim.2023.3280523 (Access: Closed)