Processing and characterization of monolithic passive-matrix GaN-based MicroLED arrays with pixel sizes from 5 to 50 μm

authored by: Steffen Bornemann, Jan Gulink, Victor Moro, Joan Canals Gil, Stefan Wolter, Georg Schottler, Daria Bezshlyakh, Joan Daniel Prades, Angel Dieguez, Andreas Waag
Abstract: MicroLED arrays with the capability of switching each pixel separately with high frequency can serve as structured micro-illumination light engines for applications in sensing, optogenetics, microscopy and many others. We describe a scalable chip process chain for the fabrication of passive-matrix microLED arrays, which were integrated with PCB-based driving electronics. The arrays were produced by deep-etching of conventional planar LED structures on sapphire, followed by filling and planarization steps. The pixel resolution lies in the range of 254 to 2540 pixels-per-inch (ppi), the arrays consist of 32 x 32 pixels. Optical output powers up to 50 μW per pixel were measured. In comparison to CMOS-based approaches, the presented technology is a simplified strategy to produce microLED arrays with high pixel counts.
External Organisation(s): Technische Universität Braunschweig
Universitat de Barcelona
Type: Article
Journal: IEEE photonics journal
Volume: 13
ISSN: 1943-0655
Publication date: 20.08.2021
Publication status: Published
Peer reviewed: Yes
ASJC Scopus subject areas: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering
Electronic version(s): https://doi.org/10.1109/JPHOT.2021.3106584 (Access: Open)

BibTeX

@article{cb76784ef4f24790b4457dba5d6f98d7,
title = "Processing and characterization of monolithic passive-matrix GaN-based MicroLED arrays with pixel sizes from 5 to 50 μm",
abstract = "MicroLED arrays with the capability of switching each pixel separately with high frequency can serve as structured micro-illumination light engines for applications in sensing, optogenetics, microscopy and many others. We describe a scalable chip process chain for the fabrication of passive-matrix microLED arrays, which were integrated with PCB-based driving electronics. The arrays were produced by deep-etching of conventional planar LED structures on sapphire, followed by filling and planarization steps. The pixel resolution lies in the range of 254 to 2540 pixels-per-inch (ppi), the arrays consist of 32 x 32 pixels. Optical output powers up to 50 μW per pixel were measured. In comparison to CMOS-based approaches, the presented technology is a simplified strategy to produce microLED arrays with high pixel counts. ",
keywords = "III-V semiconductor materials, Inorganic light-emitting diodes, Micro-light emitting diode array",
author = "Steffen Bornemann and Jan Gulink and Victor Moro and Gil, {Joan Canals} and Stefan Wolter and Georg Schottler and Daria Bezshlyakh and Prades, {Joan Daniel} and Angel Dieguez and Andreas Waag",
note = "Funding Information: Manuscript received July 14, 2021; revised August 13, 2021; accepted August 16, 2021. Date of publication August 20, 2021; date of current version September 21, 2021. This work was was supported in part by within the European projects ChipScope and SMILE, which are funded by the European Union{\textquoteright}s Horizon 2020 research and innovation program under Grant Agreements 737089 and 952135. The work was further supported in part by the Deutsche Forschungsge-meinschaft (DFG, German Research Foundation) under Germany{\textquoteright}s Excellence Strategy – EXC-2123 QuantumFrontiers – 390837967 and within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453). (Corresponding authors: Steffen Bornemann; Andreas Waag.) Steffen Bornemann, Jan G{\"u}link, Stefan Wolter, Georg Sch{\"o}ttler, Daria Bezshlyakh, and Andreas Waag are with the Institute of Semiconductor Technology, Technische Universit{\"a}t Braunschweig, 38106 Braunschweig, Germany, and also with the Laboratory for Emerging Nanometrology, Technische Universit{\"a}t Braunschweig, 38106 Braunschweig, Germany (e-mail: steffen.bornemann@tu-braun schweig.de; j.guelink@tu-braunschweig.de; stefan.wolter@tu-braunschweig. de; g.schoettler@tu-braunschweig.de; d.bezshlyakh@tu-braunschweig.de; a.waag@tu-braunschweig.de).",
year = "2021",
month = aug,
day = "20",
doi = "10.1109/JPHOT.2021.3106584",
language = "English",
volume = "13",
journal = "IEEE photonics journal",
issn = "1943-0655",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "5",
}