Silicon Carbide Stacking-Order-Induced Doping Variation in Epitaxial Graphene
- authored by
- Davood Momeni Pakdehi, Philip Schädlich, Thi Thuy Nhung Nguyen, Alexei A. Zakharov, Stefan Wundrack, Emad Najafidehaghani, Florian Speck, Klaus Pierz, Thomas Seyller, Christoph Tegenkamp, Hans Werner Schumacher
- Abstract
Generally, it is supposed that the Fermi level in epitaxial graphene is controlled by two effects: p-type polarization doping induced by the bulk of the hexagonal silicon carbide (SiC)(0001) substrate and overcompensation by donor-like states related to the buffer layer. The presented work is evidence that this effect is also related to the specific underlying SiC terrace. Here a periodic sequence of non-identical SiC terraces is fabricated, which are unambiguously attributed to specific SiC surface terminations. A clear correlation between the SiC termination and the electronic graphene properties is experimentally observed and confirmed by various complementary surface-sensitive methods. This correlation is attributed to a proximity effect of the SiC termination-dependent polarization doping on the overlying graphene layer. These findings open a new approach for a nano-scale doping-engineering by the self-patterning of epitaxial graphene and other 2D layers on dielectric polar substrates.
- External Organisation(s)
-
National Metrology Institute of Germany (PTB)
Chemnitz University of Technology (CUT)
MAX-lab
- Type
- Article
- Journal
- Advanced functional materials
- Volume
- 30
- ISSN
- 1616-301X
- Publication date
- 04.11.2020
- Publication status
- Published
- Peer reviewed
- Yes
- ASJC Scopus subject areas
- Chemistry(all), Materials Science(all), Condensed Matter Physics
- Electronic version(s)
-
https://doi.org/10.1002/adfm.202004695 (Access:
Open)