Inverted plasmonic lens design for nanometrology applications

authored by: T. Kaseberg, T. Siefke, S. Kroker, B. Bodermann
Abstract: Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.
External Organisation(s): National Metrology Institute of Germany (PTB)
Friedrich Schiller University Jena
Technische Universität Braunschweig
Type: Article
Journal: Measurement science and technology
Volume: 31
ISSN: 0957-0233
Publication date: 07.2020
Publication status: Published
Peer reviewed: Yes
ASJC Scopus subject areas: Instrumentation, Engineering (miscellaneous), Applied Mathematics
Electronic version(s): https://doi.org/10.1088/1361-6501/ab7e6b (Access: Open)

BibTeX

@article{96fdd97f35914df497d05956c7d8e97b,
title = "Inverted plasmonic lens design for nanometrology applications",
abstract = "Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.",
keywords = "ellipsometry, metrology, numerical simulations, plasmonic lenses",
author = "T. Kaseberg and T. Siefke and S. Kroker and B. Bodermann",
note = "Publisher Copyright: {\textcopyright} 2020 The Author(s). Published by IOP Publishing Ltd.",
year = "2020",
month = jul,
doi = "10.1088/1361-6501/ab7e6b",
language = "English",
volume = "31",
journal = "Measurement science and technology",
issn = "0957-0233",
publisher = "IOP Publishing Ltd.",
number = "7",
}