Silicon Carbide Stacking-Order-Induced Doping Variation in Epitaxial Graphene
- verfasst von
- Davood Momeni Pakdehi, Philip Schädlich, Thi Thuy Nhung Nguyen, Alexei A. Zakharov, Stefan Wundrack, Emad Najafidehaghani, Florian Speck, Klaus Pierz, Thomas Seyller, Christoph Tegenkamp, Hans Werner Schumacher
- Abstract
Generally, it is supposed that the Fermi level in epitaxial graphene is controlled by two effects: p-type polarization doping induced by the bulk of the hexagonal silicon carbide (SiC)(0001) substrate and overcompensation by donor-like states related to the buffer layer. The presented work is evidence that this effect is also related to the specific underlying SiC terrace. Here a periodic sequence of non-identical SiC terraces is fabricated, which are unambiguously attributed to specific SiC surface terminations. A clear correlation between the SiC termination and the electronic graphene properties is experimentally observed and confirmed by various complementary surface-sensitive methods. This correlation is attributed to a proximity effect of the SiC termination-dependent polarization doping on the overlying graphene layer. These findings open a new approach for a nano-scale doping-engineering by the self-patterning of epitaxial graphene and other 2D layers on dielectric polar substrates.
- Externe Organisation(en)
-
Physikalisch-Technische Bundesanstalt (PTB)
Technische Universität Chemnitz
MAX-lab
- Typ
- Artikel
- Journal
- Advanced functional materials
- Band
- 30
- ISSN
- 1616-301X
- Publikationsdatum
- 04.11.2020
- Publikationsstatus
- Veröffentlicht
- Peer-reviewed
- Ja
- ASJC Scopus Sachgebiete
- Chemie (insg.), Werkstoffwissenschaften (insg.), Physik der kondensierten Materie
- Elektronische Version(en)
-
https://doi.org/10.1002/adfm.202004695 (Zugang:
Offen)